Please use this identifier to cite or link to this item:
http://rguir.inflibnet.ac.in:8080/jspui/handle/123456789/16093
Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Rizvi, Syed | - |
dc.date.accessioned | 2023-02-01T04:43:13Z | - |
dc.date.available | 2023-02-01T04:43:13Z | - |
dc.date.issued | 2005 | - |
dc.identifier.isbn | 978-1-4200-2878-2 | - |
dc.identifier.uri | http://rguir.inflibnet.ac.in:8080/jspui/handle/123456789/16093 | - |
dc.language.iso | en | en_US |
dc.publisher | Taylor & Francis Group | en_US |
dc.subject | Masks for Electron Beam Projection Lithography | en_US |
dc.title | Handbook of Photomask Manufacturing Technology | en_US |
dc.type | Book | en_US |
Appears in Collections: | Electronics and Communication Engineering |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
Handbook of Photomask Manufacturing Technology.pdf Restricted Access | 18.39 MB | Adobe PDF | View/Open Request a copy |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.